A method of increasing the coercitivity of nanoscale film materials, in which two-layer Co/Pt compositions are obtained by magnetron deposition at room temperature in vacuum on the substrate of thermally oxidised Si(001), after which the annealing operation is performed at a temperature of 550 °C for at least 30 minutes. At the same time, before the stage of thermal annealing, an additional operation is introduced to bombard the surface of the deposited composition with Ar+ or N+ ions.
